Maximizing ALD and Epitaxy Efficiency by Controlling Process Termination with Real-Time Monitoring
Oxide contamination, especially from trace H₂O, is a major yield risk in semiconductor processes like ALD and Epi, which run at low pressure and temperature. Conventional bake-purge steps lack real-time feedback, causing inefficiency and wafer exposure. We developed HALO QRP, a modified CRDS system for sensitive, interference-free H₂O detection down to 1 mbar. It enables optimized purging, leak detection, and process control, reducing time, gas use, and contamination for improved yield.
Reinventing Incoming and Continuous Quality Control Systems for Real-Time Monitoring Methods
Presentation on continuous quality control monitoring systems evolution
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