Dr. Bappaditya Dey is a Senior R&D Engineer, Advanced Patterning at IMEC, Belgium. He is also responsible for developing and optimizing deep learning algorithms and architectures for solving challenging industrial problems in EUV/EBEAM Lithography and SEM Metrology as well as interdisciplinary research collaboration with multiple universities and research teams (across the globe) and mentoring students for their research thesis (MS/PhD) in this domain.

He joined IMEC in 2018 and worked in various roles since then. He received his PhD degree, majoring in Computer Engineering, from the Center for Advanced Computer Studies (CACS), University of Louisiana at Lafayette, USA. He received his B.Sc. and M.Sc. degrees in Physics (Hons.) and Electronic Science from University of Calcutta, Kolkata, India, in 2006 and 2008, respectively, and the second M. Tech degree in Computer Science and Engineering. from MAKAUT (formerly known as WBUT), Kolkata, India in 2010. He also received his third M.Sc. degree in Computer Engineering from the Center for Advanced Computer Studies (CACS), University of Louisiana at Lafayette, USA in 2017. He is a member of IEEE and SPIE. His research interests include VLSI, microelectronics, reconfigurable hardware, machine learning, computer vision, artificial intelligence, and semiconductor process optimization. Till now, he has authored/co-authored 35+ publications and has presented at several international conferences. He has also filed 9 patents so far.